Used EVG / EV GROUP 640 #293689618 for sale

EVG / EV GROUP 640 is a mask aligner designed for precision printing of micron and submicron semiconductor structures. It is a type of optical lithography tool used to transfer patterns from a reticle onto a wafer. It is ideal for printing deep submicron (DSM) features for complex structures such as DRAM, logic, and mixed-signal designs. EVG 640 is a full-field aligner with a resolution of 0.5 μm and an overlay accuracy of 0.25 μm. The tool has a global overlay of +/ 2 μm and a local overlay of +/1 μm. EV GROUP 640 is designed with a top-down projection equipment, which gives it a wide range of features and functions. The tool can print with 1 layer to 30 layer reticles at 4x, 5x or 6x laser reduction. It has a laser spot size of 0.3 μm, a field size of 16"×16" and a wafer size of 14"×14". The tool is also equipped with both Micro-Wall and White-Wall imaging technologies, which provide a high degree of focus uniformity across the entire wafer. Furthermore, the tool has a high degree of flexibility in its system configuration. It can be calibrated to ensure high process repeatability and reproducibility and offers a variety of exposure options for different requirements. 640 is easy to operate and maintain. It features a smart operator interface display that allows users to monitor unit performance and set parameters and adjust exposures. The tool is also designed with a range of safety features to minimize exposure hazards and reduce the potential for contamination. Overall, EVG / EV GROUP 640 is an advanced optical lithography tool that provides precision printing of micron and submicron structures. It is ideal for DRAM, logic, and mixed-signal designs and offers great flexibility in machine configuration. The tool is easy to operate and maintain and comes with a range of safety features to ensure quality and accuracy.