Used EVG / EV GROUP 640 #9200558 for sale

EVG / EV GROUP 640 is an advanced mask aligner used in microelectronic fabrication technology. It is used for lithography processes, such as for exposing contact details and other patterns on semiconductor wafers and glass substrates. EVG 640 is suitable for aligning and exposing a wide variety of substrates and in different resolution requirements. It is multi-functional and can perform both subtractive and additive processes, as well as multi-step processings. EV GROUP 640 can achieve a resolution accuracy of down to 0.12 µm, making it ideal for the production of small semiconductor chips, such as DRAMs and SRAMs. It can also expose large areas at high accuracy. This makes the aligner well-suited to a range of sizes and shapes, including for bumps and vias of different sizes and precise patterning. Its uniform alignment, exposure quality and long lifetime make it highly reliable for production runs. The aligner includes an automatic, integrated alignment system that uses pattern recognition techniques to capture the exposed pattern. The alignment system combines advanced guiding and locating technologies and a variety of different beam deflection techniques to provide precise and consistent alignment. The transparent substrate holders also enable the alignment of complex topography for advanced processes. 640 provides maximum throughput at low cost. Fast exposures and easy-to-use software simplify operations so that users can focus on developing and optimizing their product designs. It also provides a modular platform for customization and can be tailored to specific applications. In addition, EVG / EV GROUP 640 is equipped with a range of advanced safety features. This includes an advanced security system that safeguards against unauthorized access and tampering, as well as monitor and control functionality that provides timely warning and alerts about improper operation and potential unsafe conditions. Overall, EVG 640 is a powerful and versatile mask aligner that is suitable for a wide range of production needs. It offers high accuracy, rigid repeatability and robust safety features that make it an ideal choice for users seeking reliable and efficient lithography processes.