Used EVG / EV GROUP 640 #9210352 for sale

EVG / EV GROUP 640 is a mask aligner is a widely-used equipment for high-accuracy photolithography for the manufacture of a wide range of semiconductor devices and advanced photonic devices. It has been optimized to provide high pattern fidelity, high throughput, and accurate alignment for production and semiconductor device fabrication. The system uses 5 nm resolution alignment and 5 nanometer step and repeat which has been further improved by employing a feedback unit that senses substrate displacement and a fine motion stage to provide precise alignment accuracy and repeatability. The machine has an advanced metrology capability offering improved process performance, which means that chip designers are able to maximize chip performance. The tool allows for a wide range of chip sizes and packaging configurations, and a large variety of alignment targets, such as contact, interdigitated, stacked and poly wafer techniques. Additionally, the asset can process non-planar shapes, such as circular, elliptical, and other shapes, as well as classic "U" (vertical sidewalls) shapes. The exposure times of EVG 640 are faster than other conventional lithography systems, typically requiring only 10 to 20 ms. The model can detect sub-nanometer distortions and is capable of achieving high resolutions and alignment accuracies. The optics of the equipment are also designed to minimize flare while reducing ghost imaging. The system is equipped with a quick-load alignment stage which provides fast substrate loading, and a long-life projection lens is included. The unit also includes a highly advanced software package and a powerful graphic user interface (GUI) which facilitates setup and control of the machine. This GUI is easy to use and provides a host of features such as automated optimization of exposure settings and autofocus calibration. The software package also offers an extensive range of accurate pattern simulation capability. EV GROUP 640 is an ideal choice for advanced lithography applications in both research and production. It has been short-listed multiple times for various awards due to its robust design, excellent performance, and high-quality results.