Used EVG / EV GROUP EV 640R #9175004 for sale

Manufacturer
EVG / EV GROUP
Model
EV 640R
ID: 9175004
Wafer Size: 6"
Vintage: 1998-2000
Mask aligners, 6" 7" Mask Proximity / Soft contact / Hard contact TSA & BSA Automatic wafer handling Disassembled tool: Frame Stage Robot Lamp house Computer (3) GENMARK Robots with prealigner (3) 1kW Lamp controllers (2) Light intensity probes Printed documentation & manuals for both tools 1998-2000 vintage.
EVG / EV GROUP EV 640R Mask Aligner is an advanced tool designed to provide accurate alignment between substrates and mask patterns for high-volume production of photonic, electronic, and nanotechnological components. EVG EV 640R is suitable for application in semiconductor, MEMS and NEMS production, optical lithography, microfluidics fabrication, and other nanotechnology-focused industrial processes. EV GROUP EV 640R Mask Aligner offers precise, high-accuracy alignment of up to 6.4" x 6.4" substrates with diffraction-limited perfection combined with long-term stability. EV 640R utilizes two independent orbital motors for optimized positioning and for a fast, accurate alignment of substrates and mask patterns. This allows for low-cost photolithography processing where the highest resolution features can be achieved with less time and energy consumption. EVG / EV GROUP EV 640R is ideal for industrial applications that require nanometer alignment resolutions. The system utilizes auto-focus optical sensing, providing an auto-ranging alignment accuracy of 70nm and below in production processes. In addition to precise alignment of mask and substrates, EVG EV 640R can also be used to precisely measure distance between various points on the substrates. EV GROUP EV 640R utilizes a precise and reliable protection algorithm, as well as high-accuracy pattern alignment recognition. This ensures that patterns on the substrate and the masks will always be congruent. The system also comes with a patented indexing and leveling technology for precise planarization between substrates and masks. In addition to alignment accuracy, EV 640R has a wide range of options for improved productivity. This includes automatic wafer clamping, high-accuracy beam control for precise overlay, and an optimized vacuum control for gentle handling of soft substrates. EVG / EV GROUP EV 640R offers fast production rates and high reliability. Its large working area, scalable design, and quick mask changeover all make EVG EV 640R a valuable piece of equipment for production processes that require fast throughput and accuracy. The system is equipped with a large touch screen display and user-friendly interface, making EV GROUP EV 640R a great choice for those looking to improve their production efficiency.
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