Used HITACHI Hitech #9359868 for sale

HITACHI Hitech is a high-performance mask aligner designed for the most demanding physical vapor deposition (PVD) and photolithography processes. With a full suite of features, Hitech is ideal for performing a variety of applications, from large-scale production runs to precise etching and patterning operations. HITACHI Hitech combines advanced mask alignment technology with high-end optical components and precise micrometer-controlled motion stages to deliver consistent results with repeatable accuracy. The equipment features an advanced X-Y stage that can move up to 0.1-micron increments for precise and accurate mask alignments. Additionally, Hitech incorporates a continual Non-Vacuum Indexing technology for doing multiple layer alignments in an efficient and time-saving manner. HITACHI Hitech also provides excellent wafer uniformity through a buried channel technique that helps to maintain a consistent etch rate on the surface of every wafer. Additionally, the system is equipped with an Organic Confocal Imaging technology that can detect even the smallest details of a pattern and scan the surface of the wafer for the highest level of correction. As an innovative feature, Hitech is capable of doing stepper-integrated processes with a powerful motorized motor unit and customized track components. This layout allows users to achieve excellent process uniformity and distinctive product quality. Furthermore, with its built-in 10x measurement capability, data can be easily recorded and analyzed for optimized layer deposition. As an all-in-one package, HITACHI Hitech includes a range of components that support multiple applications. The machine provides versatile sample stages for 3D transmittance alignment operations and an array of dedicated support components to ensure high performance. Additionally, the unit comes standard with an advanced vision tool that provides the highest level of accuracy for pattern overlay alignment and precise recognition of samples. Overall, Hitech is an advanced mask aligner designed for a variety of PVD and lithography processes. By providing fast, accurate and repeatable results, HITACHI Hitech delivers superior performance for achieving optimal etching and layer deposition accuracy. With its comprehensive features and components, Hitech is the preferred mask aligner for many industry-leading manufacturers.