Used HTG 2 #293627709 for sale
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HTG 2 (High Throughput Generator) is a state-of-the-art mask aligner designed to provide high throughput lithography services to university, corporate, and industrial users. It offers comprehensive mask design, fabrication, and alignment capabilities that enable quick and easy fabrication of large numbers of devices in a cost-effective manner. At its core, 2 is a wafer stepper equipment. It operates on the principle of projecting a patterned mask onto the exposed surface of a wafer, then stepping or scanning the mask across the target area to ensure precise placement of the pattern across the wafer. To ensure precise alignment, the mask is held in contact with the wafer at all times, and the mask is stepped in a line-by-line fashion. HTG 2 is a comprehensive mask aligner, capable of the full range of standard photolithography operations. It is an advanced and precise tool for the fabrication of small and large components and devices. The system uses a variety of corrosion-resistant, durable materials and technologies, ranging from metal to Silicon dioxide, to help ensure precise placement of the pattern across the wafer. 2's precise alignment and high throughput capabilities help to reduce fabrication time and cost. Through its advanced software, the unit also offers precise control and checking of the design and data before, during, and after exposures. This ensures accuracy and eliminates potential errors within the data before the mask is exposed onto the wafer. The machine is capable of achieving resolutions of down to one nanometer and is capable of scanning the entire surface of a wafer in one go. This helps to ensure that a device is manufactured with the expected amount of accuracy and consistency. Overall, HTG 2 is an excellent tool for university research and industry-level fabrication of small components and devices. It offers precise and high throughput lithography services that ensure accurate and cost-effective fabrication of numerous, complex devices. Its software also offers precise control and checking of data to ensure accuracy, making it the perfect tool for any lithography-based project.
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