Used HTG 314-5 #114653 for sale

HTG 314-5 mask aligner is an automated device used to ensure precise and accurate alignment of masks and reticles used in the production of complex electronic devices. Mask alignment is an essential component of photolithography, the process of transferring a mask or reticle pattern to a substrate via light exposure. 314-5 is a high precision, high accuracy mask aligner designed for maximum productivity. It features dual independent 10-inch elevating stages driven by high torque stepping motors and an automated sequencing system that eliminates manual repetitive imaging cycles. It also has a vacuum chuck with a precision base vacuum system to ensure a flat, stable imaging surface. The monitor allows for live image viewing and automatic pattern recognition. HTG 314-5 uses a highly versatile 6-axis motorized manipulator, which provides both X-Y and Z-axis, as well as rotational movement, for precise alignment of the masks and reticles on the chuck. 314-5 includes an advanced optical microscope to measure the physical characteristics of very small sections of substrates. The microscope also can be used for selecting optimum points for alignment. HTG 314-5 is an efficient device for pre-Mask Assembly. It allows for very fast and accurate alignment of the pattern plates or reticles and the substrates with minimal user intervention. It also has multiple pattern correction functions to ensure high alignment accuracy. This allows for fast prototyping and parallel production runs. It also has batch processing capability and can be programmed to run multiple jobs in sequence. 314-5 is a high-precision mask aligner manufactured by Hitachi High Technologies Group. The device is designed for use in the photolithography process and provides repeatable high accuracy alignment of the masks and reticles used in this process. It offers fast and accurate imaging, combination of multiple correction functions and can be programmed to run batch processes. HTG 314-5 offers a versatile mask aligner for improving the speed and accuracy of pattern transfer.