Used HTG 36-3 #69873 for sale

HTG 36-3 is a mask aligner equipment designed to facilitate contact lithography. It is a three-stage system consisting of an Exposure Tool, a Development Tool, and a Polishing and Alignment Tool (PAT). The Exposure Tool is designed to expose the mask onto the wafer surface. It works by scanning the mask at a fixed angle of 36 degrees with a 1-kW Xe lamp whose output is focused to a 13-micron spot on the wafer. The Development Tool then uses a highly-selective developer to form desired patterns on the wafer. The pH of the developing solution is adjustable to achieve desired selectivity, and it is delivered from an Autosyringe Unit with a flow rate of up to 2 milliliters per minute. The tool also features an inlet and exhaust air conditioning machine, and a hotplate to maintain the temperature of the developing solution. The Polishing and Alignment Tool (PAT) is used to refine and align the patterns formed by the Exposure Tool and Development Tool. It is equipped with two optical heads for two alignment systems. The PAT features a heatable working stage, a controlled-thickness substrate table, and a CCD camera for image observation. It also utilizes a laser interferometer and a CNC controller to accurately position the masks relative to the substrate. Additionally, the PAT has a polishing function that allows it to remove undesired particles or oxidation layers to ensure smoother patterns. Overall, 36-3 is a reliable, efficient mask aligner tool that enables complex patterns to be formed on a silicon wafer. It is beneficial to various microelectronic device manufacturers that require precise alignment of circuit patterns.