Used JAPAN SCIENCE ENGINEERING MA-4200 #9107350 for sale

JAPAN SCIENCE ENGINEERING MA-4200 is a fully automatic mask aligner that is used for photolithography and is capable of producing high-precision patterns for semiconductor and optoelectronics devices. This mask aligner provides precision alignment with high accuracy and has high wafer throughput that allows for fabrication processes to be completed quickly and efficiently. MA-4200 is equipped with a high-speed automatic pattern recognition equipment that accurately aligns and matches the desired circuit patterns with the required mask. It uses a sector splitter mirror to achieve the correct alignment of the pattern with the mask and to produce repeatable results. The pattern recognition system also compensates for wafer warpage and other environmental influences. In addition, JAPAN SCIENCE ENGINEERING MA-4200 is equipped with a high-resolution mask projection unit. This machine of lenses and mirrors projects the mask onto the wafer accurately and precisely in four dimensions, enabling formation of advanced semiconductor circuit patterns. The tool also provides high speed exposure and has a fast throughput of up to 10 wafers per minute. MA-4200 also includes features such as an advanced process control asset that allows users to monitor and control the alignment of the mask and wafer with accuracy, making process modifications on the fly. The model allows for optimal alignment yields and improved process consistency. This mask aligner also includes a computer-controlled focus adjuster which is used to automatically maintain the focus during the entire exposure process. This ensures that the pattern is precisely projected onto the wafer. JAPAN SCIENCE ENGINEERING MA-4200 is programmed using an easy-to-learn interfacing thread, allowing users to start using the device with a minimum of effort. Overall, MA-4200 is an efficient and reliable mask aligner that offers precision alignment and high throughput. It is ideal for applications ranging from basic scribe layouts to cutting-edge 3-D photolithography and provides a comprehensive solution for a variety of photolithography needs.