Used JAPAN SCIENCE ENGINEERING MA-4201 #293626847 for sale

JAPAN SCIENCE ENGINEERING MA-4201 Mask Aligner, also known as a 'stepper', is a type of photolithography equipment that is used to transfer patterns from a photomask to a substrate. This equipment is typically used in the manufacture of integrated circuits, LCD displays, thin-film magnetic heads, medical instruments and other devices. MA-4201 provides precise alignment of masks and substrates using sophisticated optics, lenses, and fine positional adjustments. JAPAN SCIENCE ENGINEERING MA-4201 is designed for high-precision accuracy, with capability for alignment within 0.1 micron. It uses an advanced auto alignment system, whereby the substrate is placed on a stage which is moved using precision motor drives, allowing for fine positional adjustments. The auto alignment system allows for real-time recognition of the substrate coordinates in relation to the photomask in use. Additionally, MA-4201 is capable of recording highly detailed exposure patterns of individual layers and elements within a circuit layout. JAPAN SCIENCE ENGINEERING MA-4201 is equipped with a sophisticated optical system, which includes a high end microscope and a UV light source. This is used to accurately align the photomask with the substrate, and can be adjusted according to the application. Its accuracy is further enhanced by the use of sophisticated software algorithms, offering enhanced focus and pattern accuracy. MA-4201 can be used with a range of photomasks and substrates, allowing for high-precision alignment in a variety of programs. Additionally, JAPAN SCIENCE ENGINEERING MA-4201 features a low power consumption design, with a low heat emission rate. This makes it suitable for extended use without any thermal damage to the substrate. This is especially important when working with sensitive processes, such as thin-film magnetic heads or LCD displays. Overall, MA-4201 Mask Aligner is a highly sophisticated piece of equipment for photolithography. It offers highly precise alignment capabilities, with a fine positional accuracy of 0.1 micron. Its sophisticated optics and software allow for real-time recognition of the substrate coordinates in relation to the photomask. Furthermore, its low power consumption design and heat emission rate make it suitable for extended use, helping to prevent thermal damage.