Used JEC / JAPAN ENGINEERING COMPANY MA-2400 #9005623 for sale

JEC / JAPAN ENGINEERING company MA-2400 Mask Aligner is an essential tool for photolithography, providing precise and repeatable control of features on semiconductor wafers. This highly-automated device allows for accurate registration of photomasks onto wafer surfaces to produce precise circuit patterns with ultra-high accuracy. JEC MA-2400 Mask Aligner features a highly-accurate two-stage patterning equipment, providing exceptional performance for fine-patterning applications. The built-in Autocollimator and Image Processor technology provides precise alignment of the mask to the wafer, with a repeatability of within 1 um. The software is user-friendly and provides automated parameter settings and maintenance control for repeatable processes. The system can accommodate wafers of up to 8 inch/200 mm and can process substrates with thicknesses ranging from 25 microns to 150 microns. The Compact Dual Beam Unit is easy to set up, allowing shorter cycle time for processes that can be run with a single beam machine. JAPAN ENGINEERING company MA-2400 Mask Aligner is a highly versatile tool that can be used for various applications including contact printing, scanning and 1:1 replication. The mechanical and optical parts of the asset are highly aerodynamic and optimized for superior performance. MA-2400 Mask Aligner is designed with a fast-heating vacuum chuck, which ensures a high degree of accuracy, even with substrates up to 8 inch/200 mm in size. The chuck pressure is adjustable depending on the thickness of the substrate, and the chuck temperature can be adjusted for better substrate control. JEC / JAPAN ENGINEERING company MA-2400 Mask Aligner can be used in a variety of cleanroom environments ranging from Class 10 to ISO 7, making it an ideal choice for sensitive processes. In addition, the model can be used with any type of polyarylate, so it can be used in conjunction with acid-resistant materials like polycarbonate. JEC MA-2400 Mask Aligner is an invaluable tool for photolithography, providing a wide range of features and benefits to ensure precise, repeatable control over fine circuit patterns. The highly automated equipment is easy to install, use, and maintain, providing an effective solution for photolithography processes.