Used KARL SUSS 260MS022 #9252212 for sale

KARL SUSS 260MS022 is a fully automated, state-of-the-art Mask Aligner used in photolithography to accurately etch patterns onto integrated circuits and other microdevices. The aligner is made of a combination of components that are designed to track the patterns generated from the photomask. This combination includes a micro-stepper motor, a control unit, a stepper number encoder, a glass reticle stage, an emission nozzle, a mask alignment system, and a specimen chuck. By combining all these components, the Mask Aligner provides high precision and accuracy to assure that the resulting etch results are consistent. The micro-stepper motor on the Mask Aligner works to perform precision rotation. It operates without contact, creating an enhanced motion control. The motor has a small and low profile design which keeps the thermal load generated from the device low, which helps ensure the highest resolution of the etched pattern. The Control Unit, which is made to control the speed of the stepper motor, allows the operator to adjust the speed of the motor and thus of the etch pattern. This allows the operator to truly make a custom product by creating exactly the etch pattern desired. The Stepper Number Encoder allows the operator to choose how many steps the alignment system will take to move the mask according to the pattern set. This gives the operator more control and accuracy when adjusting the heights of the alignment system, as it is up to the operator to select the step number required to move the stage correctly. The glass reticle stage allows for accuracy when placing the photomask in the exact location on the wafer and is used to identify the chip layout areas on the mask. The emission nozzle of theMaskAligner sprays a liquid material onto the photomask, thus ensuring the correct etch pattern. Last, but not least, is the specimen chuck. This feature is used to securely and accurately hold the wafer in place for when the etching process begins. This helps maintain the alignment of the pattern on the wafer to the transferred pattern on the mask. All these components work together to provide a sophisticated, yet efficient, Mask Aligner which is capable of producing the highest resolution patterns with minimal wastage of the expensive and delicate photomasks. 260MS022 is an ideal Mask Aligner for microelectronic device production.