Used KARL SUSS / MICROTEC 260MS022 #9316168 for sale

KARL SUSS / MICROTEC 260MS022 Mask Aligner is a powerful and accurate lithography equipment used for thick resists and multi-layer applications. It is one of the most advanced mask aligner in the market and it offers a unique combination of features, including: high throughput, optimized optics for accuracy and speed, high quality image resolution, and reliable automation for efficient and user-friendly operation and maintenance. MICROTEC 260MS022 uses a two-axis cast iron closed loop system to accurately move the reticle and substrate holders along the X and Y axis and to accurately focus the reticle and substrate. The two axis cast iron design helps improve stability and minimizes vibration, providing a superior alignment accuracy. The aligner is also equipped with 12µm vertical long range displacement and a built-in 3D profilometer to measure and verify the profile of the resist after exposure. The aligner is powered by an advanced software platform providing all the features necessary for user-friendly operation and maintenance. It includes powerful tracking, alignment, and inspection features that automatically provide precise and accurate results. Additionally, it offers real-time monitoring, adjustment features to fine-tune the alignment process, as well as a user-friendly graphical user interface for controlling and organizing the workflow. KARL SUSS 260MS022 is able to reach very precise alignment accuracy of ±2µm with a speed of 125µm/s. The equipments have a magnification range from 0.75X to 12.5x with a resolution of 3lp/cm to 200lp/cm. The aligner is able to offer processing of 2"x2" to 8"x8" full field on single or double sided substrates with a throughput of 25 to 40 wafers/hour. The Mask Aligner is also equipped with light source and bright field illumination for enhanced control and accuracy. These features combined with its high quality optics and precision engineering enable 260MS022 to provide excellent performance, accuracy, reliability and cost effectiveness. This comprehensive equipment is designed to meet the needs of high volume production environments and is ideal for lithography applications in the PCB, MEMS, and semiconductor industries.