Used KARL SUSS / MICROTEC BA 6 #9363766 for sale

KARL SUSS / MICROTEC BA 6 is a leading-edge mask aligner used for lithography in the manufacture of semiconductor products. This aligner is a compact and size-efficient lithography instrument suited for smaller and intricate chip layout processes or higher-resolution wafer manufacturing processes. The mask aligner works by first setting the size of the chip layout to be exposed, then a finely ground quartz-glass resist material is applied to the surface of the chip. The quartz-glass resist is then exposed to UV light passband of 0.2 microns with a wavelength of 193nm while the mask is moved closer to the chip surface. The mask aligner then utilises its advanced positioning and beam deflection systems to move the mask over the chip. The precise positioning of the mask is made possible by the use of a stable laser controller and a high-resolution linear motor, while the beam deflection ensures the uniform application of UV light to all regions of the chip layout. MICROTEC BA 6 aligner also offers a high exposure accuracy of up to 1.0um, which allows for superior layer alignment accuracy due to the control offered over the size of chip layout structures. This aligner is also capable of scanning frequencies up to 1000Hz, which makes it suitable for high throughput manufacturing of masks. Additionally, it is equipped with a motorized zoom optics and a Rayleigh laser interferometer for enhanced accuracy of exposure. KARL SUSS BA 6 also includes a host of advanced features designed to facilitate the production process. These features include a PLC-based automated job table, a six-axis alignment system, and an embossing capability for finish layers. Moreover, this aligner is accompanied by a powerful computer software program that provides detailed analysis of the chip-layout which is then used by technicians to facilitate the entire layout and alignment process. Overall, BA 6 mask aligner is a state-of-the-art lithography tool used in semiconductor chip production. It combines high-end positioning and UV light exposure capabilities with a host of advanced features in order to facilitate efficient and accurate production of semiconductor devices. The highly accurate beam deflection also allows for precise alignment of chip layouts, while its high throughput of 1000Hz makes it suitable for commercial usage.