Used KARL SUSS / MICROTEC BA 8 #9382268 for sale

KARL SUSS / MICROTEC BA 8 is an automatic, high precision, user-friendly mask aligner for use in semiconductor device fabrication. It is optimized for a variety of photolithography applications, such as precise patterning of thin films, resist masking and wafer patterning. With its advanced features and efficient working modes, MICROTEC BA 8 offers an ideal platform for fast and accurate lithography processing. KARL SUSS BA 8 is composed of a number of components, including a 6-axis alignment head, an automated wafer/mask staging mechanism, a wafer-to-mask alignment equipment, and a high-resolution imaging system incorporating a 10X zoom lens, coaxial illumination to reduce shadows and minimize edge artifacts, and built-in automatic programmable control unit with a user-friendly graphic interface. These components are optimally integrated into a small footprint to save time and provide higher resolution results. The alignment head of BA 8 is designed to hold and move both the wafer and the mask with high accuracy. The wafer/mask stage consists of two mechanicalless motors coupled to a precision encoder and a travel stage to ensure accurate, repeatable, single-point alignment in both x and y directions. Furthermore, a precision indexer provides repeatable mask movement for multi-exposure alignment processes. KARL SUSS / MICROTEC BA 8´s wafer-to-mask alignment machine uses a combination of lighting, imaging and optical displacement technologies to precisely locate both wafer and mask. This provides an efficient, accurate alignment process that reduces coating errors and other defects, all in one automatic low-temperature operation. Moreover, the mask chuck is equipped with high-resolution fiducial recognition software to further reduce misalignment. Finally, the imaging tool of MICROTEC BA 8 offers superior resolution at small feature sizes. The 10x optical zoom asset allows for high precision patterning, while its coaxial light source eliminates shadows and ensures a more evenly exposed resist. In addition, this optics model is built-in to align the wafer to the mask basis to reduce critical dimension variation. Overall, KARL SUSS BA 8 mask aligner provides high resolution patterning required for fabrication of big systems with accuracy, efficiency, and repeatability. With its superior features and capabilities, BA 8 is the perfect choice for cost-effective lithography processing.