Used KARL SUSS / MICROTEC M6000L #9012375 for sale

KARL SUSS / MICROTEC M6000L
ID: 9012375
Wafer Size: 4"-6"
Vintage: 2002
Lift off systems, 4"-6" Chemical delivery cabinet Power supply (2) Chillers 2002 vintage.
KARL SUSS / MICROTEC M6000L is a production mask aligner specifically designed for advanced semiconductor lithography processes. It features high throughput, versatility, and excellent process control. MICROTEC M6000L utilizes a high-precision linear positioning stage and an automated "teach-and-replay"/alignment equipment, allowing for the accurate alignment between the mask and wafer. The system is programmed with a user-friendly, intuitive graphic interface, with a strong algorithm to support product development, engineering, and production needs. KARL SUSS M6000L offers a resolution of 1µm for positioning, and a high alignment accuracy of 6µm. It also supports the use of both the standard and advanced lithography processes, including deep UV, E-beam, and i-line. Additionally, the unit is designed to handle large substrates up to 12" in size as well as standard 4" and 5" wafers. M6000L aligner features an automatic clamping machine which provides a secure and repeatable connection between the substrate holder and the tool. A vacuum port and vacuum-footprint isolation are also included to provide adequate vacuum pressure for the substrate during critical exposure stages. KARL SUSS / MICROTEC M6000L provides several advanced features which enable reproducible and repeatable lithography processes. These features include temperature-controlled environment, automatic wettability control at the mask and substrate, process monitoring using chamber consumables, and remote monitoring of the wafer's alignment and exposure process. The asset also includes a digital image capture camera which enables focal length monitoring to ensure high-resolution imaging performance in the exposed pattern. MICROTEC M6000L is an advanced, full-featured lithography solution designed to ensure the optimal pattern development of advanced semiconductor materials. The model provides users with a comprehensive lithography equipment, enabling high throughput and accurate processes. It can help users achieve repeatability, robust performance, and cost-efficiencies while delivering high-quality devices.
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