Used KARL SUSS / MICROTEC MA 100E #293585808 for sale

KARL SUSS / MICROTEC MA 100E is a highly precise mask aligner that is commonly used in photolithography processes. It is used to accurately lay down and deposit thin coatings of photoresist onto the surface of the desired component or circuit to be made. MICROTEC MA100E uses advanced technology to ensure that light is precisely focused and accurately controlled, making it possible to accurately transfer a circuit pattern to the resist. This allows for the highest resolution possible in a photolithography process, making it suitable for a wide range of applications. KARL SUSS MA 100 E features a field modification feature that allows for the modification of the photoresist thickness and the deposited pattern size. This is done using two separate control units that can be set for different applications. Additionally, this equipment utilizes an advanced vector scan alignment feature which ensures that the deposited photoresist is accurately aligned over the target substrate. KARL SUSS / MICROTEC MA 100 E also features an advanced imaging system that is used to accurately record images of the applied photoresist. The imaging unit makes use of a two-camera machine that is used to examine the resist prior to yet not too long after exposure to the light source. This allows for the results to be accurately verified. KARL SUSS / MICROTEC MA100E is capable of positioning the substrate with an accuracy of 10 nanometers, making it an ideal choice for any precision photolithography process. It is also capable of operating at high frequencies, making it suitable for high speed production runs. Overall, MICROTEC MA 100 E is a reliable, high-high accuracy and quality mask aligner that is used to transfer patterns to a substrate accurately and with precision. With its advanced features and technology it is capable of providing users with the highest quality of results in any photolithography process. It is an ideal choice for any applications that require highly accurate Photolithographic masks.