Used KARL SUSS / MICROTEC MA 100E #293607936 for sale

ID: 293607936
Wafer Size: 2"-6"
Vintage: 2014
Automatic lithography machine, 2"-6" Type: One-sided Gases: CDA, N2 Optical path and CCD Light non-functional 2014 vintage.
KARL SUSS / MICROTEC MA 100E is a precision mask aligner used for advanced wafer-level device manufacturing. It has a resolution of 1μm and a uniformity based on a 3σ process control of 0.7μm. The equipment is designed with a full-area Overlay Alignment Method that enables high-speed alignment, in-situ task switching, and advanced processing. The generator uses five heads with a 6" or 8" workpiece size that is quickly changed through a quick-change robot. It has a 14-bit ADC and a 13-bit DAC with a gain of 12.5dB. The step and repeat accuracy of the machine is within 0.2μm, and its registration accuracy is within 0.3μm. The field size is adjustable, with a minimum field size of 0.6 mm and a maximum of 200mm. MICROTEC MA100E's system controller offers sophisticated multi-product programming, the ability to define multiple design database entries, and an integrated database covering the products in the process database. Data can be entered into a database for repeat production. The device offers a variety of imaging tools, including advanced reticle stitching, high-speed vision focus, corner stitching, and convenient touchscreen control. It features alignment registration with a photo-masking unit, which offers fast and precise alignment on a variety of substrates. Its high-precision mechanics supports advanced structures with high aspect ratios, and a step-and-repeat autofocus ensures precise image transfer and registration. Its advanced lithography machine allows high-accuracy alignment and exposure of small structures without the need for scaffolding. KARL SUSS MA 100 E provides fast and accurate alignments, improving overall throughput and yield. Its intuitive and easy-to-use software ensures high-quality wafer manufacturing and is capable of producing very high-resolution images. With its high-accuracy performance and integrated database, it is an excellent choice for top-level production in device fabrication.
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