Used KARL SUSS / MICROTEC MA 100E #293670040 for sale

KARL SUSS / MICROTEC MA 100E is a high-precision mask aligner designed for precise alignment of photomasks or reticles for semiconductor lithography applications. MICROTEC MA100E is capable of providing both single and multiple exposure services for device geometries of 15nm or greater, and can image features down to 100 nm. The equipment consists of an optical table, a finely calibrated motion system, a light source, a detector for alignment precision, a wafer stage, and a wafer holder. The light source can be set to UV, visible, or IR light, and provides a uniform, high-resolution illumination of the wafer. The motion unit is designed to minimize aberrations and errors associated with spatial translation for alignment accuracy. The machine has the capability to move to selected alignment points with high precision, and the wafer can be loaded and unloaded quickly and safely. KARL SUSS MA 100 E also comes with an automatic collimator camera to provide precise alignment of individual photomask features as well as a CCD camera for inspecting, viewing, and measuring the patterned wafer. Furthermore, a temperature-controlled microscope objective is also included that can be used for examining individual feature characteristics on the wafer. By utilizing an advanced real-time error correction tool, MICROTEC MA 100 E has high registration accuracy throughout the printing process. The asset also features an 8-bit Gray Code platform, which combines autofocus, startup calibration, real-time image serving, and auto exposure for the highest levels of accuracy. For more precise adjustment, there is a fine adjustment wheel to set the exact pattern for imprinting. MICROTEC MA 100E is versatile and can be used for a variety of applications, including the creation of patterned layers for wafer manufacturing. The model is capable of imprinting a high-resolution line-width of 10nm without any distortions or pixelation. Additionally, MA 100E can be used for prototyping and prototype-based production. It features a depth prescanning and imaging equipment for surface checking of the patterned wafer, and the design allows for installation of a wide variety of imaging, detecting, and pattern-measuring equipment. Overall, KARL SUSS MA 100E mask aligner offers a dependable and precise lithography process for a wide range of production applications. It provides high registration accuracy combined with quick loading and unloading of the wafer and facilities for visual inspection. KARL SUSS / MICROTEC MA100E is a simple, intuitive system that allows for precise pattern alignment and accurate imaging of features down to 10 nm line-widths without any pixelation or distortions.