Used KARL SUSS / MICROTEC MA 100E #9013165 for sale

KARL SUSS / MICROTEC MA 100E Mask Aligner is a highly accurate and reliable optical lithography tool specifically designed to produce sub-micron features in photolithographically fabricated semiconductor devices. MICROTEC MA100E, with its large field size, high-speed scanning and autofocus, is ideal for production of integrated circuits. KARL SUSS MA 100 E employs several key components and innovative technologies. It has an Advanced Alignment Equipment (AAS) that uses dual cameras and software to accurately align the mask, wafer, and reticle for printing. This system allows for high accuracy of alignment even within z-axis which is the vertical offset between the mask and wafer. MA 100E utilizes a high-end Large Area Illumination (LAI) unit. This machine provides a uniform illumination pattern using a combination of fiber optics and LED technology. This lighting tool also provides precise control of exposure and dose, allowing for better control over printed patterns. KARL SUSS / MICROTEC MA100E uses an advanced wafer transport mechanism which provides precise coat and develop steps to ensure accuracy. This is important for devices where small features are critical. KARL SUSS MA100E has an integrated image analysis asset which allows for the optimization of exposures and dose control. It has the capability to yield high-resolution images of in-process devices, helping to ensure the parameters of lithography are precise and accurate. In addition, KARL SUSS / MICROTEC MA 100 E has a special slot targeted towards automated reticle loading and unloading, as well as an array of feature-rich software programs that can facilitate management of device specifications, making the process faster and more efficient. MICROTEC MA 100E also has an array of safety features, such as vacuum and dust protection, as well as power control and circuit protection for added safety. MA100E is a durable and reliable machine, with a long operating life and low maintenance requirements. It is designed to streamline the process of producing complex and intricate IC designs, allowing for efficient and cost-effective production of ICs.