Used KARL SUSS / MICROTEC MA 100E #9185929 for sale

KARL SUSS / MICROTEC MA 100E is an advanced mask aligner used in the fabrication of devices for microfabrication. The device is designed for high-precision alignment of silicon wafers, masks and substrates. The MA100 aligner is comprised of a high-precision optical subsystem that uses laser alignment technology to provide precise alignment of the object being machined. This includes lasers of varying wavelength, such as ultraviolet (UV) and visible light. It also includes a standard six inch photomask and a submicron alignment precision. The machine is capable of performing a range of tasks in a single device, including but not limited to, photolithography, ion-milling and ion-etching steps. Thanks to its high-precision optical alignment technology, it is also well-suited for wafer dicing and architecture related tasks in microelectronic devices. It also enables pattern staining on precision film. The MA100 has three major components: optical imaging microscope, stage and metrology systems. The optical imaging microscope provides high-resolution imaging of the devices that are being machined, allowing the user to adjust any gaps or misalignments. The stage provides accurate movement of the mask and substrate, enabling precise pattern alignment. Meanwhile, the metrology system is used to measure the exact position and alignment accuracy of the devices. The MA100 has a number of additional features, such as multiple layers of depth of focus, enabling simultaneous machining on multiple layers. It also allows for repositioning of the wafer during alignment, allowing the user to optimize the alignment process. Furthermore, it has a process stability feature that helps in minimizing the cumulative errors during processing. Finally, it includes a statistics output feature allowing the user to track the progression of the machining process. In summary, MICROTEC MA100E is an advanced mask aligner used in the fabrication of microelectronic devices. It uses laser alignment technology to provide precise alignment of wafers, masks and substrates, as well as enabling pattern staining on precision film. It also provides a range of additional features, such as process stability and tracking of errors, to help ensure a smooth and efficient machining process.