Used KARL SUSS / MICROTEC MA 100E #9185933 for sale

MICROTEC MA {KARL SUSS Autoaligner) 100E is a mask aligner specially designed for wafer-level lithography. The equipment utilizes deep UV (DUV) light sources with an exposure wavelength of 365nm and has a maximum loadable wafer size of 200mm. This system is ideally suited for advanced semiconductor device fabrication, including photomask and reticle production. KARL SUSS / MICROTEC MA 100E uses air-bearing aligned X/Y stage technology that provides precise alignment and high resolution, making it suitable for high-end production environments. MICROTEC MA100E has a resolution of 2.5 µm in the x and y directions, with an accuracy of 2-5 µm and a Z-axis accuracy of 25 nm. Its highly precise alignment and focus guarantees submicron resolution patterns with a high degree of accuracy and repeatability. This alignment accuracy is made possible by the implementation of an automated optical alignment unit with a telecentric lens design. KARL SUSS MA 100 E is outfitted with a comprehensive user-friendly interface that allows users to quickly and easily set up and monitor alignment processes. The integrated Windows graphical user interface is intuitive and makes it easy to incorporate automated recipes for multiple applications. It also offers DICOM (Digital Imaging and Communications in Medicine) configuration with image-based alignment for placing patterns in the precise location relative to the wafer. MICROTEC MA 100 E also has a high maximum throughput rate of 1,500 wafers/hour, making it an excellent choice for high-volume production applications. It also offers an optional advanced cooling machine designed to reduce the risk of thermal distortion during lithography. MICROTEC MA 100E is also environmentally friendly. It uses an environmental control and airflow cooling tool to reduce the noise level and general environmental impact during operation. Overall, KARL SUSS / MICROTEC MA 100 E Mask Aligner is an ideal mask aligner for precise and reliable device fabrication, specifically for photomask and reticle production. Its precise alignment and focus capabilities, along with its advanced optical alignment asset and high throughput rate, make it an excellent choice for high-end production applications.