Used KARL SUSS / MICROTEC MA 100E #9185938 for sale

ID: 9185938
Mask aligner Damaged part: WEC Currently installed.
KARL SUSS / MICROTEC MA 100E is an ultraviolet (UV) photolithography mask aligner that is used to fabricate integrated circuits, functional mechanical structures, and other 3D structures using micro and nanofabrication techniques. The equipment offers the highest precision UV photolithography available, with a working area of 5 in. x 8 in. It is suitable for a wide range of industrial and academic applications. MICROTEC MA100E has two 540 nm CW laser light sources (6W and 4W). An optical power meter ensures accurate power level settings. The components are housed in a thermal-shielded box for stability and durability. The system also has a moving stage to accurately position the substrate in relation to the mm-resolution mask plate. The three-axis motorized stage has a resolution of 0.1 um and a maximum speed of 2000 um/sec. The unit has several advantageous features such as automatic mask registration, low-constant feature aberrations, low thermal drift, high-definition images, and enhanced overlap correction. KARL SUSS MA 100 E is also equipped with an HMI control interface with a touch panel offering up to 8 steps of programming for precise repeatability. The operator can adjust parameters such as exposure time, repeat count, and alignment including mask alignment, XY alignment, and repeat alignment. KARL SUSS MA100E uses a UV photomask to generate up to 256 beams of light with a circular beam diameter of 6um. The maximum projection of the image onto the substrate is ±5 mm on X and Y axes at a maximum resolution of 0.5um. The machine is also capable of plasma etching for precise patterning. The tool can generate a wide range of structures, from nanometer-scale features to micrometer-scale ones. Finally, KARL SUSS / MICROTEC MA100E is also equipped with a protective aluminum mask which blocks any stray UV light that may cause damage to sensitive materials. The asset also has safety features including a key switch, motion detection, and UV light shutter. In summary, MICROTEC MA 100E is an advanced UV photolithography mask aligner with advanced features such as automatic mask registration, low-constant feature aberrations, low thermal drift, high-definition images, and enhanced overlap correction. The model is an excellent choice for creating precise patterns on various substrates.
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