Used KARL SUSS / MICROTEC MA 100E #9197137 for sale

KARL SUSS / MICROTEC MA 100E is a fully automated mask aligner that is used for high resolution photolithographic microfabrication processes. It is well suited for the fabrication of integrated circuits, sensors, actuators and other microelectronic components. MICROTEC MA100E equipment includes an integrated PC based control unit and an optical/mechanical alignment system with automatic substrate and reticle loading. The reticle is mounted on a 5 axis stage and uses a digital micrometer for precision alignment. The reticle stage features manual mode, full rotation and recessing options. The substrate is held on a vacuum chuck and is loaded using a manual or automated substrate handling unit. The vacuum chuck is motor driven and can minimize substrate misalignment. The machine is also equipped with an opitcal viewing and image sensing tool that features integrated illumination and an optical microscope. A resolution of 1µm can be achieved with this optics setup. KARL SUSS MA 100 E also has a 6 or12 inch vacuum actuated substrate stage with a 5µm XY movement capability. The mask aligner is capable of projecting a light pattern from the reticle onto the photoresist coated substrate with a 99.7% light transmission efficiency. The high resolution projection optics ensures a diffuse light patter across the substrate, enabling the formation of complex structures with extremely high level of lateral resolution, accurate registration and high contrast. MICROTEC MA 100 E can be operated at a wide range of atmosphere fractions and vacuum levels, allowing for highly conformal coatings and enhanced layer uniformity. The mask aligner has a wide range of alignment accuracy, ranging from 380 nm to 75 µm, depending on the materials used. MA 100 E is easy to use and maintain, thanks to its intuitive user interface and precision design. It can easily be integrated into a variety of production processes, making it an ideal tool for micro-photolithography.