Used KARL SUSS / MICROTEC MA 100E #9278299 for sale

KARL SUSS / MICROTEC MA 100E Mask Aligner is an all in one photolithography system, designed for various micro-electronic applications such as micro-fabrication, nano-fabrication, and microelectromechanical systems (MEMS). The unit is an automated system, capable of patterning surface features with spatial resolution in the micron and nanometer range. It features an easy to use graphical user interface (GUI) with a large 11.6-inch touchscreen, allowing for control of the micropositioners and device parameters. The controller is equipped with four degrees of freedom, allowing high accuracy alignment and lithography. The mask holder's optical system has autofocus functionality, ensuring accuracy of the alignment with the mask to within 2 μm. The light source is an LED array with maximum illuminance of 31000 mW/m2 and an adjustable uniformity of 80% or better. The light source offers a variety of wavelengths including green, blue, or ultraviolet range for various applications. In addition, the tool has variable intensity control to further control the exposure. The lithography stage can accommodate wafers or substrates up to 150mm in diameter, with 2-inch and 4-inch adaptors for smaller substrates. It is equipped with a vacuum chucking mechanism to ensure the highest accuracy during alignment and exposure. An exposed material tray is available for dry and water-soluble resists. The elapsed time of the process can be monitored with the help of a passed real-time timer. Finally, the device also features a highest run-to-run repeatability of 1.5 μm and run-to-run stitching accuracy of 0.5 μm. The heavy-duty construction, flexibility, and accuracy of MICROTEC MA100E Mask Aligner make it an ideal tool for even the most advanced applications in micro- and nano-fabrication.