Used KARL SUSS / MICROTEC MA 100E #9389776 for sale

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ID: 9389776
Vintage: 2010
Mask aligner Damaged parts: UPS Mercury lamp controller Chuck Control cabinet 2010 vintage.
KARL SUSS / MICROTEC MA 100E mask aligner is a powerful and highly precise equipment for aligning moulds for the production of nanoelectronic devices. This equipment offers an effective solution for photolithography of micro- and nanostructure devices, as it allows for high-precision alignment of the alignment masks used in the process. In photolithography, MICROTEC MA100E mask aligner utilizes an extremely accurate optical mechanical system to precisely align moulds and wafers. The unit has a wide variety of features that allow it to effectively align the masks in the most accurate manner, providing even the most complex structures with highly accurate results. KARL SUSS MA 100 E mask aligner has a wide range of features that make it ideal for various photolithography projects. The mask-carrier machine is designed with three different sets of kinematic guiding systems for higher accuracy and stability during the alignment. It has an adjustable optical encoder which enables it to measure the tiniest differences in sub-millimetric accuracies. In addition, this tool also has a highly reliable low profile kinematic holder asset that ensures extremely accurate alignment of the mask and wafer combination. The model offers numerous other features that further enhance its accuracy and efficiency. With its adjustable temperature control, MA 100 E can maintain the most ideal temperature for the photolithography development. It also has the unique capability of auto-focusing, automatically adjusting the optics as per the size of the project, thus allowing for faster and more accurate alignment. MICROTEC MA 100 E is a highly versatile equipment that can be used to handle a variety of projects, regardless of complexity. It offers both manual and fully automated modes of operation, allowing for the utmost in flexibility. Its numerous accuracy features and safety protocols ensure that the process is completed with the highest precision and quality. Furthermore, MA 100E mask aligner offers top-level technology to ensure that photolithography projects are completed with the highest precision and accuracy.
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