Used KARL SUSS / MICROTEC MA 100E #9389780 for sale

KARL SUSS / MICROTEC MA 100E mask aligner is a high-precision, cost-efficient device designed for a variety of uses including photolithography, semiconductor optoelectronics, and optics. It automates the tasks of aligning and exposing masks onto substrates while making use of sophisticated software and hardware features. MICROTEC MA100E is equipped with a vacuum chuck to hold the substrate securely in place and a two-axis, high-precision stage. It boasts a maximum resolution of 10 µm and boasts repeatability of 5 µm. KARL SUSS MA 100 E is built with an intense UV halogen lamp, which provides feature sizes of up to 3 µm. The built-in camera-based auto-alignment system allows users to use image-based alignment marks, while the built-in integrated sensors enable users to perform high-precision, high-speed alignment corrections. The device also offers automatic focus detect, ensures repeatable results, and offers unexcelled feature resolution and accuracy for high-precision photolithography applications. The integral XY stage allows for mask and substrate sizes up to 100mm. The stage incorporates a robust, low vibration industrial-grade linear motor drive system with 0.5 μ and 25 μm open loop repeatability. The slow and fast motor speeds can be set for precision alignment and for optimized stage speed, respectively. The fast motor speed can be set to up to 200mm/s, while the slow motor speed is up to 1mm/s. KARL SUSS MA 100E also features optical, fluidic, and electric feed-throughs, allowing photoresist to be transferred with minimum contamination, and closed loop crosstalk compensation to eliminate global substrate motion errors. MA 100E is equipped with an ergonomic operations console, allowing users to control the unit with a simple keypad interface. The on-screen display ensures ease of use, while the built-in diagnostic tools allow for quick troubleshooting and problem solving. KARL SUSS / MICROTEC MA100E is programmed with a wide variety of advanced functions that automate the alignment, exposure, and contact process for a wide variety of substrates, including silicon wafers, quartz, lithium niobate, polyimide, and ceramic. The automatic cleanup feature allows for efficient removal of residual cleaning solution, resulting in less contact time on critical areas and faster mask/substrate exchange times. Finally, the device features comprehensive safety features, including a halogen safety shutter and CE-certified safety class 1 scanning. MA 100 E is an advanced and reliable mask aligner that is designed to minimize programming time, minimize waste caused by imperfect alignment, and maximize precision and throughput for a wide range of photolithography and optoelectronics applications.