Used KARL SUSS / MICROTEC MA-150 CC #9105740 for sale

ID: 9105740
Wafer Size: 6"
Vintage: 2001
Mask aligner, 6" Pattern recognition CIC 1200 UV 400 optics 1000 Watt lamp housing 2001 vintage.
KARL SUSS / MICROTEC MA-150 CC Mask Aligner is a state of the art automated photolithography tool. It is ideal for processing small devices with complex geometries. Specifically, MICROTEC MA150CC is suited for devices with a size range of 1mm - 150mm. Features such as automatic tool calibration, repeatable alignment accuracy and high definition imaging make it an ideal choice for producing fine line photoresists on a variety of wafers from 0.75 inch to 6 inch in diameter. KARL SUSS MA 150CC consists of an integrated platform including a light source, a wafer chamber, a stepper motor, and precision optical and mechanical components. The light source produces UV radiation necessary for exposing photoresists. It includes an integrated mercury arc lamp for high power output as well as incandescent light for visual inspection. The wafer chamber is a precision quartz chamber with a 100 mm gate and Langmuir-Blodgett film deposition, which allows for uniform coating of the wafer. In addition, the chamber is equipped with a vent to control the atmosphere. The stepper motor is designed to provide precise microscopic positioning accuracy, which minimizes critical dimension misalignment. The stepper is engineered with a 1 mm rotation point accuracy, which is critical for exposure of photoresists. Furthermore, this advanced equipment includes integrated alignment software for precise alignment of the mask and substrate. The system also includes an alignment monitoring unit in order to maintain precision during exposure. Furthermore, MICROTEC MA-150CC provides high definition imaging with a resolution of less than 0.25 microns. This provides superior imaging and pattern definition on the most critical device levels. KARL SUSS MA-150CC also features advanced robotic automation capability, allowing it to screen, align, and transfer wafers into and out of the exposure chamber. In addition, the machine allows for fast changeover, providing consistent levels of quality and performance. Overall, MICROTEC MA-150 CC Mask Aligner is an advanced photolithography tool that delivers superior performance. It is well suited for producing high definition and fine line photoresists on a variety of substrates, and its integrated automation machine provides consistent levels of quality and performance. The machine can handle wafers from 0.75 inch to 6 inch in diameter and provides excellent accuracy and precision with resolution down to 0.25 microns. All of these features make KARL SUSS MA150CC an ideal choice for producing complex devices with intricate geometries.
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