Used KARL SUSS / MICROTEC MA-150 CC #9229272 for sale
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ID: 9229272
Mask aligner
Power supply: CIC 1200
PC Type: DSM-P233 MMX
Relay interlock box
TSA camera: XC-50
TSA objectives: 5 x / 0.15, 10 x / 0.30, 20 x / 0.40
BSK microscope: 520R Rechts / Right
BSA-Camera 264537 Rechts / Right
Cognex 5000
Power meter
Exposure optics: UV 400
Prealigner
Prealigner sensor head: SI / GAAS / INP
Mask holder
Chuck
Main microcontroller:
Input card: 260PC105-05
Input card: 260PC113-01
D/A Cov DVM²: 260PC102-05
Parallel input / Output exp BSA: 260PC103-03
Valve driver: 260PCPC103-01
Funnel prealigner: 260PC129-02
Manipulators: 260PC116-01
D/A Conv DVM BSA: 260PC102-05
Motor driver DVM²: 260PC109-02
Elevator right: 260PC119-01
Elevator left: 260PC119-01
Microscope x-motor: 260PC119-03
Mask x-motor: 260PC156-04
Microscope y-motor: 260PC119-03
Mask y-motor: 260PC156-04
Microscope motor: 260PC119-03
Mask motor: 260PC156-04
Z-Axis: 260PC119-03
Wafer transfer: 260PC126-03
4 Channels A/D card MOM: 260PC176-03
CPU MOM: 260PC105-16
Stage driver MOM: 260PC168-06
Valve driver 3CB: 260PC104-01
Power supply standard: 260PC124-02
Power: 230 V
Lamp: 350 Watt bulb
2002 vintage.
KARL SUSS / MICROTEC MA-150 CC is a high-precision mask aligner that is used in the fabrication of nanostructured or microfabricated devices such as semiconductor chips, sensors and nano-electromechanical systems (NEMS). The aligner is capable of aligning different masks to each other with an accuracy of up to one nanometer. It utilizes a near-field optical equipment that is coupled with a high-precision stage to achieve extremely accurate alignment. This system also allows for alignment of multiple masks in rapid succession. MICROTEC MA150CC offers a variety of features to ensure that each new device is accurately positioned and ready for lithographic processing. Using the unit's customizable alignment workspace, on-axis correction algorithm, and automated wafer scanning for improved device accuracy, this mask aligner offers unmatched levels of precision and repeatability. In addition, the machine can detect any unintended wafer misalignment, enabling users to make corrections without having to stop the entire process. KARL SUSS MA 150CC tool is equipped with variable aperture control to ensure that only the desired area is exposed during the lithographic process. Its automated optical centering feature minimizes the need for manual adjustment, while its precise stage motion control ensures that stage motion is accurate and repeatable. In addition, its advanced temperature-controlled chamber ensures temperature stability during lithography procedures. In addition to its excellent alignment performance, KARL SUSS / MICROTEC MA150CC is also a valuable solution for high-volume production processes. This asset is capable of handling multiple wafers at the same time, allowing users to maximize throughput and minimize space. It also supports a variety of advanced photolithography processes including Deep UV, IC Scope and Step & Scan. Overall, KARL SUSS MA-150 CC is a powerful, high-precision mask aligner that offers users unmatched accuracy and repeatability for the fabrication of nanostructured and microfabricated devices. With features such as on-axis correction, automated wafer scanning, and variable aperture control, this model provides an optimum solution for high-volume production processes.
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