Used KARL SUSS / MICROTEC MA-150 CC #9299824 for sale

ID: 9299824
Vintage: 1999
Mask aligner Top side microscope Top side alignment Proximity mask holder: 7 x 7" CIC 1200 Power supply Lamp house: 1000 W UV 400 Optics HITACHI Monitor, 14" Chuck, 6" XRS Pre-aligner Auto alignment option 1999 vintage.
KARL SUSS / MICROTEC MA-150 CC is a lens contact type mask aligner which is used for a wide range of photolithography applications. It provides high throughput and accuracy, as well as detailed process control. MICROTEC MA150CC is designed to allow micro and nanodevice manufacturing, with precision alignment and exposure flexibility. This mask aligner has a working area of 150 mm x 150 mm and is ideal for prototyping, high volume production and R&D. It has a high-intensity light source, maxi-stringer accuracy and alignment error correction, and can accommodate a variety of wafer sizes and substrates. KARL SUSS MA 150CC features an active alignment system which ensures alignment accuracy with a repeatability of 1.5 microns. Its automated alignment functions include both one-point and two-point measurement alignment, and it can be used to image features from 3 µm to 61 µm with a numerical aperture of 0.45. This mask aligner is also equipped with several process control features which ensure superior printing accuracy. These include an open-loop PID system, real-time monitoring and feedback, and precise overdrive control. To ensure high-quality lithography, KARL SUSS MA 150 CC has an integrated wafer handling system and recipe-based automatic exposure optimization. Finally, the mask aligner is designed to simplify the process of aligning and exposing wafers. It comes with an intuitive user interface and powerful, integrated data management and analysis tools. In addition, it has a high speed option which allows users to increase throughput and reduce total turn-around time. MICROTEC MA 150 CC mask aligner is an efficient and cost-effective solution for a wide range of photolithography applications, offering exceptional accuracy and process control. It is ideal for those who require frequent and accurate alignment, precise exposure and high throughput capabilities.
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