Used KARL SUSS / MICROTEC MA 150 M/BSA #9268269 for sale
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ID: 9268269
Wafer Size: 4"-6"
Vintage: 1996
Mask aligner
UV 400 Exposure optics
Light intensity sensor: 320/405 nm
W-100 / W-150 Mask holder
Topside microscope:
Type: DVM 6
Objectives: NPL 5x / L 25x
Bottom side microscope:
Magnifications: 110 / 330
Resolution: 2.4 µm
Proximity, 4"
Ball diameter: 2000 µm, 1998 µm, 1998 µm
Exposure illumination:
Area, 6"
Lamp: 1000 Watt
Position:
Fly eye: 5 mm
Condenser: 38 mm
Lens plate 1: 69 mm
Lens plate 2: 90 mm
1996 vintage.
MICROTEC MA 150 M/BSA is a mask aligner (MA) that is used in the manufacturing of engineered microstructures. This advanced technology is used to align thin film mask patterns to the device surfaces of semiconductor wafers with extremely high precision. The MA 150 is designed with advanced features, allowing for production of high-quality, reliable products with very fine resolutions. The MA 150 utilizes a patented binary optical equipment to align masks with features as fine as 2 µm. Masks can be aligned in any direction with an accuracy of 1 µm. The mask is held in place by a vacuum and is easily aligned with a semi-automated precision stage. The system also includes an automated feeder that is capable of delivering up to 2 wafers per second to the alignment stage. KARL SUSS MA 150 can be used for photolithography processes such as photomask alignment, exposure, development, cleaning, and post-processing steps. It utilizes a high-resolution optimized binary optical unit with a numerical aperture greater than 0.45. The positional accuracy is improved by the use of displacement measuring sensors that are installed in the two directions before each exposure. The MA 150 is also equipped with an integrated direct view microscope. This allows operators to visualize the pattern on the application surface, as well as the alignment accuracy. This feature is made possible with an advanced optics design that allows the image to be seen without distortion. KARL SUSS / MICROTEC MA 150 M/BSA is a reliable and accurate solution for photolithography that can help ensure the production of high-quality microstructures. The advanced features and design of the machine allow for precise mask alignment with improved positional accuracy, while the direct view microscope provides added control and monitoring capabilities. This makes the MA 150 M/BSA an ideal choice for those looking to produce highly reliable products with superior repeatability.
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