Used KARL SUSS / MICROTEC MA 150 M #9190410 for sale

KARL SUSS / MICROTEC MA 150 M is a multi-purpose mask aligner that is used for various pattern generation, photolithography processes, and precision alignment tasks. It is capable of doing high-resolution contact exposure, proximity exposure, layer alignment, and 3-D alignment. The mask aligner includes an advanced control equipment with an integrated precision positioning stage, an 8" x 8" quartz exposure source, a high precision CCD sensor for XY Alignment, and an XY alignment computer. The Precision Positioning System within the mask aligner is designed to provide excellent repeatability, accuracy, and stability. It uses piezoelectric actuators to make precise corrections in the X, Y and Z directions. This unit allows the work piece to be accurately aligned and correctly positioned during the exposure process. The exposure source utilizes advanced collimator optics which produce a uniform beam in the working field. This ensures that patterns are accurately exposed during the photolithography process. The CCD sensor provides high-precision detection and alignment capabilities and is capable of aligning to the submicron level. The mask aligner also features a computerized control machine with a built-in personal computer for controlling device operations and performing data processing. The computer has an easy to use graphical user interface which allows for easy programming and results display. This tool also includes a numeric keypad and a video monitor for visualizing and interacting with the asset. MICROTEC MA 150M is compatible with a variety of masks and exposure tools including MICROTEC MA 150 Mask Aligner Table, and a variety of accessories and exposure tools such as I-Line, 248 nm, and 365 nm exposure tools. KARL SUSS MA-150M is compatible with many substrates, materials, and patterns and also offers a variety of alignment and exposure functions. Overall, KARL SUSS MA-150 M mask aligner is an efficient, high-precision device that offers excellent pattern generation, photolithography, and alignment capabilities. It is designed to produce defined features and repeatable accuracy and stability, resulting in exceptional exposure and alignment results.