Used KARL SUSS / MICROTEC MA-150 #293600832 for sale
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ID: 293600832
Wafer Size: 6''
Mask aligner, 6"
Substrates, 6" x 6"
M206 / M236 Split field microscopes
Objectives: 5x, 10x, 20x
Eyepiece Magnification: 10x
Micrometer spindles
UV Ranges with optimized diffraction reducing systems
Splitfield topside microscope with turret
C-Mount for IR camera adaption
Alignment stage with loaded IR chuck
IR Illuminators and tube stage for target positioning
IR Tubes
Spare parts
Tool kit
X-Drive
IR Tool:
Chuck
Maskholder
Spacers for maskstage clamp
Stage:
X, Y Theta
Z Alignment
Wedge error compensation
Microscope manipulator with adapter
Movement synchronized with alignment
Lamp house LH 1000: 350 W / 1000 W lamp
With optical tube and mirror house / Eclipse mirror
CRT Display
Serial dialog operator interface
Substrate size: 1" x 1" - 4" x 4", Pieces
Mask size: 7" x 7"
Exposure system:
Vacuum contact and proximity
Gas separation: 0-90 um
Gas adjustment resolution: 1 µm
Contact pressure: 0.02 - 1.0 N/cm²
Exposure optics:
Wavelength / Range / Source
UV400 / 350 mm - 450 mm / 1000 W Hg
UV300 / 208 mm - 350 nm / 1000 W Hg
Alignment:
Top Side Alignment (TSA)
Accuracy: TSA down to 0.5 µm
Back side alignment
Accuracy: BSA down to 1.5 µm
Alignment stage:
Alignment range X: ±5 mm
Alignment range Y: ±5 mm
Alignment range θ: ±3°
Mechanical resolution X, Yθ: 0.05 μm
UV400 With high peak intensity at 365 nm and 405 nm
Exposure area: 6"
CIC500 for 350 W HBO
Maximum intensity at 365 nm: 19 ±4% mW/cm²
Maximum intensity at 405 nm: 30 ±4% mW/cm²
Power supply: 110 V / 220V, 50/60 Hz, 1500 W.
KARL SUSS / MICROTEC MA-150 is a mask-aligner designed to perform the photolithography process required to construct microelectronic components, such as semiconductor chips. This type of machine is an important tool for the manufacture of circuitry used in industrial processes and consumer products. MICROTEC MA150 uses a process called "step-and-repeat" lithography in order to produce microelectronic parts. This equipment works by first exposing a glass photomask to a light source, causing a pattern of photolithography to be projected onto the substrate being treated. This photomask can be filled with a variety of different patterns which dictate the shape, size, and placement of the patterns which will be etched into the substrate. Next, the substrate is placed onto the stage of KARL SUSS MA 150; a series of stepper motors precisely adjust the substrate's position, or "step and repeat," causing the desired patterns to be aligned. Heated from underneath and exposed to light from the overhead optical system, the substrate is then bombarded with ions to etch the patterns onto the substrate. This process is repeated for as many "masks" as are necessary for the desired product. KARL SUSS / MICROTEC MA 150 is a highly automated unit, which requires very little operator input. Its software package provides comprehensive process recipes which minimize the risk of incorrect alignment and other errors. Additionally, KARL SUSS MA-150 has sophisticated diagnostics, reticles, and photomasks which allow the machine to be used with a wide range of substrates. MA 150 is a highly efficient, cost-effective solution for photolithography processes. It is user-friendly and enables manufacturers to produce microelectronic components quickly and accurately. MA150 is a valuable asset to any production line, providing increased efficiency and enhanced product quality.
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