Used KARL SUSS / MICROTEC MA-150 #293695701 for sale

KARL SUSS / MICROTEC MA-150 Mask Aligner is a high precision photo-lithography equipment designed to accurately align and expose photo-resist masks to substrates in order to pattern integrated circuits. MICROTEC MA150 features a substrate table with a maximum size of 4" x 4" that supports rigid substrates like silicon, glass, quartz and dielectrics as well as flexible substrates like polyvinylidene chloride (PVDF), polyurethane and polyester. The aligner also includes a mask cassette that can hold up to four 4" x 4" masks and a mask holder with a 5-position gear-driven, sample chuck for automatic substrate loading/unloading. To ensure accurate and repeatable alignments, KARL SUSS MA 150 has a motorized three-axis alignment stage which is driven by linear encoders and has positioning accuracy of up to 0.1 µm. It also includes an auto-focus system with three objective lenses: 4X, 10X and 20X which together provide a magnificent 50-micron field of view. The aligner's optical unit has an interpixel resolution of 0.2µm, a variable exposure time of 200ms to 10000ms, an LED power of 9mW/cm2, and an exposure range of up to 8J/cm2. MA-150 mask aligner uses a linear synchro-micro-scanning technique to expose the substrate with a minimum linewidth of 1 µm. It is suitable for UV, Near-IR and E-beam photoresists and features an automated front-end control machine that can simplify the operation and is compatible with DOS, UNIX and Windows platforms. The tool offers a high-precision vacuum subsystem for substrate handling and alignment using a user-programmable motion control asset. MA150 Mask Aligner is a reliable, efficient and cost-effective photolithography solution that can be used for wafer probing, micro-bump flattening, high-aspect-ratio UV-writing, RGB auto-color sensitized lithography, as well as other microfabrication processes. With its robust construction and intuitive operating model, it is an ideal tool for cost-efficient prototyping and pilot production.