Used KARL SUSS / MICROTEC MA-150 #293822128 for sale
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KARL SUSS / MICROTEC MA-150 is a binary optics, contact alignment equipment designed to provide precise alignment of mask and wafer during lithography. This system is especially helpful when fine features are critical to the application. The unit offers repeatable and accurate alignment of 0.25 micron features or better. MICROTEC MA150 utilizes a focus-alignment technique which detects both the focus of the optical machine and the relative positions of the two components. The alignment tool is comprised of three components: an optical projection asset, an adjustable wafer stage, and a stationary mask stage. The optical projection model has been designed to provide fine beam focusing to better resolve pattern alignments. It also has an array of lenses which minimize distortion and reduce field curvature to ensure optimal pattern alignment. The wafer stage of KARL SUSS MA 150 is strapped to a low-vibrationXYZ stage. This allows for movement inX, Y, and Z axes for precise positioning of the wafer relative to the mask. The XY stage of MA 150 is driven by four stepper motors, allowing for the accurate placement and positioning of the wafer. The stationary mask stage is designed to ensure that the mask remains in a fixed position while alignment operations are conducted. It has a large area to accommodate larger masks and a raised height to minimize obstructions typically caused by the mask frame. KARL SUSS MA-150 mask stage comes pre-equiped with an air bearing platform to ensure stable positioning of the mask during alignment operations. KARL SUSS MA150 provides a high-resolution viewing equipment which utilizes a fixed viewing port and camera. This camera provides the operator with stereographic imagery, allowing for precise adjustments and corrections to the alignment system. MICROTEC MA 150 also has a number of safety features to protect it from contamination, reducing the chance of damage to the unit and components. These safety features include a dust cover for the mask stage to prevent dust from entering the field of view, as well as a dust catcher for the optical projection machine. All in all, MICROTEC MA-150 mask aligner is not only precise and accurate, but also robust and safe. It has a range of features designed to ensure optimum performance in a range of micro-lithography applications.
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