Used KARL SUSS / MICROTEC MA-150 #9229271 for sale

ID: 9229271
Mask aligner Top side only Power supply: CIC 1000 PC type: TYAN / FN 9160015 Relay interlock box TSA microscope TSA objectives: 5x / 0.15, 10x / 0.30, 20x / 0.40 COGNEX 5000 Power meter Exposure optics: UV 400 HP Pre-aligner Mask holder Voltage: 230 V Lamp: 350 Watts bulb 2001 vintage.
KARL SUSS / MICROTEC MA-150 is a versatile and reliable mask aligner for the alignment of thin substrates with the purpose of manufacturing microelectronic devices. MICROTEC MA150 is based on a modular structure and consists of a mainframe that houses the optics, such as lens and cameras, as well as a sample plate. The optics and mechanisms move between the sample plate and the wafers, which are accurately aligned by the mask. KARL SUSS MA 150's precision optical system is driven by precise stepping motors and the X, Y, Z axes and θ axis are used to accurately move the sample chuck and mask chuck, respectively, during alignment. Its unique mask-to-wafer alignment technique is also used to minimize pattern misalignment, and its advanced design helps maintain precise alignment accuracy. In terms of its performance, MICROTEC MA-150 has a high-precision capability of up to 0.5-micron accuracy with a maximum chuck-to-chuck travel of 15mm. It has a wide range of exposure capabilities, with a maximum exposure area of 4.5mm x 6.0mm and a maximum correction of 24.5° both in X and Y axes. Additionally, KARL SUSS / MICROTEC MA150 offers a high throughput of up to eight wafers per hour, depending upon the size and complexity of the wafers. Furthermore, MA150 has a robust construction, and its sophisticated ergonomics make it suitable for a variety of industrial applications. KARL SUSS / MICROTEC MA 150's modular structure makes it easy to maintain and repair, with the company offering spare parts and services for its customers. In conclusion, MA-150 is a reliable and versatile mask aligner that is suitable for the manufacturing of microelectronic devices. It offers high precision, a wide range of exposure capabilities, and a high throughput, making it an ideal choice for a variety of applications.
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