Used KARL SUSS / MICROTEC MA-151 #9095086 for sale

KARL SUSS / MICROTEC MA-151 is a computer-controlled mask aligner used for patterning thin film and wafer processing, lithography and inspection, and photolithography in the microelectronic industry. The equipment consists of an XYZ moving stage, high-precision positioning system, and a unique projection optics unit that allows for the precise alignment and exposure of patterns and features on a wafer or substrate. MICROTEC MA-151 is capable of patterning wafers up to 4.0 inches in diameter. The XYZ moving stage of KARL SUSS MA-151 allows for high-precision positioning of the substrate and mask relative to one another. Its high-precision positioning machine ensures perfect alignment of the mask to the substrate using a series of laser alignment sensors that can detect misalignment of as little as 0.2 microns. This allows for precise, high-resolution patterning to be achieved. The projection optics tool of MA-151 consists of a state-of-the-art industry-leading Carl Zeiss lens, a high-powered Xenon lamp, and a light-controller. This combination allows for nano-scale features to be formed on the substrate with very high resolution. The light-controller of KARL SUSS / MICROTEC MA-151 has a wide range of adjustable settings including exposure duration and intensity, which allows the user to fine-tune the patterning process for specific applications. MICROTEC MA-151 uses a patented dry movement mechanism that increases efficiency and repeatability of results. This reduces the setup time and the amount of time required in between each cycle. The asset is also equipped with a comprehensive graphical user interface that provides timely feedback on the current status of the model, as well as the progress of various operations. In conclusion, KARL SUSS MA-151 is a high-precision mask aligner intended for patterning wafers or substrates with nano-scale features. Its precision XYZ moving stage, high-precision positioning equipment and advanced projection optics ensure accurate alignment and exposure of microelectronic features, making MA-151 the ideal choice for lithography and thin film and wafer processing, inspection and photolithography operations.