Used KARL SUSS / MICROTEC MA 200 CC #293806364 for sale

KARL SUSS / MICROTEC MA 200 CC is a mask aligner used for photolithography processes. It is designed to provide high precision optical alignment for positioning of wafers on a stage with accurate X-Y-Z movement capabilities. This device allows for applications requiring very high levels of accuracy, such as semiconductor processing, optical coating, LCD, LED, MEMS, and thin film deposition. MICROTEC MA 200CC includes a 198 mm active field diameter and 7.9 μm repeatability, as well as an aperture up to 175 mm. It is equipped with an alignment microscopy equipment, which ensures precise optical alignment for the wafers. Furthermore, the microscope includes a laser system for accurate registration of patterns on the mask with the wafers. All alignment functions are controlled by a microprocessor-based unit. KARL SUSS MA-200 CC supports up to three masks at a time. It offers higher throughput with its high precision X-Y optical alignment machine: the field size is 20x20 mm² to 150x150 mm². KARL SUSS MA 200CC also facilitates fast pattern changes for production of fine pattern circuits. Moreover, a patented automation tool enables automatic navigation of the microscope, eliminating manual alignment and providing repeatability and accuracy. MICROTEC MA-200 CC also features an automatic cleaning asset to reduce scratches and residue. It includes an advanced substrate handling model with adjustable suction and lift mechanisms. The aligner is also designed to be compatible with various mask materials such as quartz, glass, and epoxy. MA-200 CC is a versatile, high precision mask aligner that provides excellent control for applications requiring high levels of accuracy. It offers exceptional repeatability and precision alignment, as well as a cleaning equipment that reduces scratches and residues. It is a great choice for a variety of applications including semiconductor processing, optical coating, LCD, LED, MEMS, and thin film deposition.