Used KARL SUSS / MICROTEC MA 200 CC #9173378 for sale

KARL SUSS / MICROTEC MA 200 CC is a mask aligner used primarily for research and development of electronic circuitry and photomask production. The unit provides high resolution precision alignment with a capacity of up to 200 mm wafers and a variable base magnification range between 10X and 60X. It can also accommodate the application of photoresist on up to 200 mm wafers and allows adjustment to the exposure settings for various resist types. The device utilizes stepper motors and optical sensors for precise alignment and focus control, providing reliable and repeatable results for direct write applications. It features a fiducial recognition and centering system with an accuracy of +/- 0.10 mm. The camera in the device can detect the wafer alignment marks with minimum reflectivity. Furthermore, it has an auto-focus mechanism to ensure the highest level of accuracy during exposure. MICROTEC MA 200CC also features automatic wafer recognition, advanced process control, and an algorithm that allows for the optimization of exposure parameters. It is capable of patterning transparent layers using quartz, chrome, and aluminum photomasks, as well as a wide variety of photoresist materials. The device can process a variety of materials including epoxy, PDMS, SiO2, Si3N4, and Polyimide, as well as a range of advanced materials such as Ni, Ti, Au, Pd, and Cr. KARL SUSS MA-200 CC is ideal for research and development applications including electronic circuitry, photomasks, and photoresist processing. It is designed to provide the highest level of accuracy, precision, and repeatability, ensuring reliable and repeatable results. It is also easy to use and allows for a variety of materials to be patterned. The device is an invaluable tool for developers of electronic circuitry and photomask production, providing cost-efficient and high precision results.