Used KARL SUSS / MICROTEC MA 200 Compact #9289493 for sale

KARL SUSS / MICROTEC MA 200 Compact is an automated, fully automated, mask-aligner designed for convenient and accurate planarization of photomasks for microlithography. It is a closed-loop mask aligner that uses patented beam-steering technology to rapidly align masks with high precision. The aligner features a unique, rigid four-column frame that enables a wide range of alignment strategies. With its low-vibration design and linear slide design, MICROTEC MA 200 Compact provides excellent long-term stability and reliable results. KARL SUSS MA-200 COMPACT has two scanning mechanisms. The first is a patented beam-steering self-alignment mechanism that uses both active and passive elements to automatically align the mask within a few nanometers of the specified position. The second is a fixed beam-deflection mechanism with a field of view up to 2000 μm, allowing for a wide range of patterning coverage. The aligner can be equipped with a variety of chucks and wafer stages, and features an orderly wafer exchange system facilitating rapid mask changes. KARL SUSS / MICROTEC MA-200 COMPACT is equipped with a laser-diode laser for automatic alignment and a continuous coverglass scanning system for edge detection and validation. KARL SUSS MA 200 Compact is designed to provide precise lateral alignment accuracy to automatically process wafers as large as 200 mm in diameter and as thick as 4.5 mm. In addition, MICROTEC MA-200 COMPACT is equipped with two integrated, precision scanning lenses to image the sample onto the mask for correct alignment. These lenses are fully achromatic and designed to provide maximum imaging flexibility. This aligner also features advanced features such as scanning accelerometers to reduce vibration, and an in-plane correction mechanism to eliminate any remaining alignment residuals due to wafer flexure. MA 200 Compact offers easy operation and minimal operator training, providing multiple levels of user access for uninterrupted production. The user-friendly design with graphical user interface, easy calibration, and multiple testing/validation steps allow operators to quickly get up and running with mask aligner. MA-200 COMPACT provides maximum repeatability and versatility for mask processing, and is ideal for high-precision photolithography applications.