Used KARL SUSS / MICROTEC MA 200 Compact #9391681 for sale

KARL SUSS / MICROTEC MA 200 Compact is an advanced mask aligner equipment designed for processing microelectronic products and devices. It is a multi-user system capable of achieving high resolutions with 0.30 μm feature sizes. It is a reliable, user-friendly unit providing cost effective photolithography solutions with fast mask exchange times. MICROTEC MA 200 Compact is an advanced mask aligner that specializes in high-precision lithography techniques. This precise machine delivers perfect surface overlaps and lateral registration accuracy up to ±0.1 μm. It also offers a number of alignment modes such as direct writing using a laser techniques and matrix registration, which is the use of masks pre-positioned with reference markers that are imaged onto the substrate and used for alignment. KARL SUSS MA-200 COMPACT also provides micro-contrast imaging of up to 300 nm. This tool is capable of handling various jobs ranging from large substrates and products to small wafers. The substrate holder allows for the substrate to be placed in different orientation facilitating the precise alignment of various products. The asset can process wafer with a thickness from 0.1 to 8 mm, and features a high-resolution auto focus to ensure repeatable alignments. In addition, the device also features advanced automation and is capable of processing wafer or substrates ranging from 6 inches to 8 inches in diameter. Its flexible optical design provides excellent imaging performance across all focal lengths. It also features a 200 mm lens for a greater optical depth of focus. The input and output staging of MICROTEC MA-200 COMPACT is equipped with two mask drum handlers which can bring an efficient robotic mask exchange. KARL SUSS / MICROTEC MA-200 COMPACT mask aligner is equipped with standard safety features for darkroom and fab operations. It is designed to ensure the protection of the operator as well as the equipment and it also has several self-diagnostic functions and safety interlocks which can detect malfunctions. The model is also equipped with the newest version of MA Enterprise software package. This state-of-the-art software offers powerful features such as automated optimization, control charts, leakage analysis, and many other tools that streamline the lithography process. Furthermore, it features built-in equipment control, which allows users to remotely control the system and monitor valuable unit and product information. MA-200 COMPACT is a provider of advanced photolithography solutions with precise equipment, reliable operation, and cost-effective solutions.