Used KARL SUSS / MICROTEC MA 200 EL #9193662 for sale

KARL SUSS / MICROTEC MA 200 EL is a mask aligner, designed for photolithography process to create micron or sub-micron features in microelectronic devices. It is suitable for applications such as photomasks, replicas, micro-machining, MEMS, diamond turning (ultra-precision optical diamond cutting), and others. The device uses a small, high-speed mask-aligner to precisely point the desired pattern onto the photomask, and then the mask is exposed on a substrata. The equipment is equipped with a 6-axis motion system and a motorized microscope which allows to make a precise alignment with respect to the substrate. The unit also includes a variable angle and a motorized slit aperture for fine adjustment of the exposure parameters. MICROTEC MA 200 EL is controlled by an X-Y scanning stage. It is capable of providing a working area of up to 200x200mm and a number of sample substrates of up to 25 x 25mm, up to 1µm field accuracy. Maximum velocity is 3.5 m/s. The machine uses a high-performance 16-bit SPiD-2 controller for controlling the motorized slit with the motion stage, achieving sub-micron accuracy alignment. It also includes an FPGA-based vision tool, capable of automatically identifying the substrata position. KARL SUSS MA200 EL includes an improved single-mask, single-exposure mode, with an exposure time of up to 5 seconds. It is capable of automatically controlling the exposure parameters according to the design layout. Accuracy and repeatability of the alignment are enhanced by the deflection control. Additionally, the asset is capable of manually adjusting the vertical misalignment angle between the mask and the chip. The device is compact, lightweight and very easy to maintain, making it an ideal choice for practical process engineering and development applications. It can be easily integrated in a standard cleanroom environment.