Used KARL SUSS / MICROTEC MA 200 #293614878 for sale

KARL SUSS / MICROTEC MA 200 is a highly precise, versatile, and powerful mask aligner designed specifically for optical lithography processes. It is capable of performing highly accurate and repeatable alignment of various precision masks to various substrates including substrates such as glass, silicon and ceramics. MICROTEC MA200 features a unique three-stage alignment system, four-point optical alignment, a mechanical tilt stage, and a built-in microcontroller. This combination allows for exceptionally accurate and repeatable alignment results. KARL SUSS MA-200's three-stage alignment system is a specialized feature that offers precision and repeatability in the lithography process. The first stage is the coarse alignment, which is performed by the mechanical tilt stage. This tilt stage enables the user to move the substrate to the desired location and alignment angle. Once the coarse alignment is completed, the four-point optical alignment is used to fine-tune the alignment. This stage utilizes four separate optics heads to measure the alignment of the mask and the substrate. Finally, the microcontroller is used to analyze the data from the two previous stages and correct any discrepancies. MA-200 is also highly versatile, as it can accommodate various substrates ranging from glass to silicon. This is possible due to the built-in microcontroller inside the mask aligner. This microcontroller is equipped with specialized software that can accurately and precisely measure the size, thickness and shape of each substrate. The microcontroller can also adjust the tilt stage and four-point optics structure of each substrate, allowing for the alignment process to be optimized for each size, shape, and material. Overall, KARL SUSS MA200 is a powerful, highly precise, and versatile mask aligner, as it features a unique three-stage alignment system, four-point optics, a mechanical tilt stage, and a built-in microcontroller. This mask aligner makes lithographic processes much more accurate, reliable, and repeatable, making it a great choice for any optical lithography procedure.