Used KARL SUSS / MICROTEC MA 200 #9212244 for sale

KARL SUSS / MICROTEC MA 200 is a highly advanced automated mask aligner for lithography processing. It is designed to provide excellent lithographic performance for both Photolithography and mask alignment applications. MICROTEC MA200 is a fully automated wafer stepper, capable of handling 6" and 8" TEL substrate wafers. KARL SUSS MA-200 utilizes LED exposure technology for high performance and high throughput. LEDs are extremely reliable with long lifespans and they emit very short exposure wavelengths for higher resolution and superior resolution than mercury arc lamps. The LED light source also produces less heat, which reduces the risk of heat-induced damage to the sensitive photosensitive resist material. The motor assembly moves the LED head and substrate table to ensure precise alignment between the photomask and wafer. MA-200 also has an advanced software control system that accurately aligns the photomask to the substrate. The software is easy to use with built-in macros and may be customized to meet customer requirements. MICROTEC MA 200 also offers a full range of data manipulation and analysis functions as well as automated alignment accuracy verification tools. The machine also offers a variety of programmable feature sizes, which allow the user to tailor the desired masking processes to different substrates. KARL SUSS MA 200 can be used for both photolithography and etching processes and is ideal for creating complex patterns on transistors, microelectronic components, and other structures. In conclusion, MICROTEC MA-200 is a high precision, fully automated mask aligner. It offers precise, reliable lithographic processing with clean, reproducible patterns in a wide range of applications. The LED-based light source is reliable, efficient, and offers excellent resolution and throughput. The software allows for customization of the masking process as well as the analysis of the results. Overall, MA 200 is an excellent choice for any advanced lithographic application.