Used KARL SUSS / MICROTEC MA 200 #9222504 for sale

KARL SUSS / MICROTEC MA 200 is an automated mask aligner used for the precision alignment and exposure of photomasks in the production of microelectronic devices. MICROTEC MA200 offers the precision and speed required to achieve modern microelectronics manufacturing yields. KARL SUSS MA-200 uses a stepped object table to precisely align electronic devices of varying shapes and sizes in the X, Y and Z directions. Through the combination of its fine pitch stage and accurate mechanical alignment, it can achieve sub-micron accuracy positioning of electronic components and rapid set-up times. MICROTEC MA 200 utilizes a 65,000-position ultra fine pitch mechanical alignment XY table for positioning of objects or substrates. Leica optics provide a 200mm field of view to acquire working fields with high background contrast and even low light levels, while a white light source provides wide-field exposure for alignment targets. KARL SUSS / MICROTEC MA200 offers multiple exposure capabilities with up to four quartz radiant lamps and a variety of interchangeable lamp sources for UV and visible light exposure. The lamps are connected to a power supply with a maximum setting of 1000 Watt/cm2. The power supply ensures an even and consistent maximum exposure to the substrate. MA200 is equipped with laser fiducial alignment for optimal accuracy of parts alignment, as well as multiple step-and-repeat capabilities. Step-and-repeat allows for efficient use of substrate space by automatically repeating the same structure to multiple locations on the substrate. KARL SUSS MA 200 offers a novel framework for analyzing global exposure uniformity. This system incorporates global non-uniformity compensation (GNUC) and advanced process control (APC) and provides real-time feedback and automated adjustment, leading to improved reliability and better yield. MICROTEC MA-200 mask aligner is an essential tool for efficient and accurate photomask production. Its high-precision mechanical alignment, multiple exposure functions, laser fiducial alignment, and APC system are all designed to aid in the production of high-quality photomasks for the microelectronics industry.