Used KARL SUSS / MICROTEC MA 200 #9238448 for sale

KARL SUSS / MICROTEC MA 200
ID: 9238448
Wafer Size: 6"-8"
Vintage: 1992
Mask aligner, 6"-8" 1992 vintage.
KARL SUSS / MICROTEC MA 200 is a mask aligner that utilizes advanced precision alignment features to ensure accurate alignment of photolithography masks. This mask aligner provides extremely accurate alignment of the masks with a 1.25µm step size, and maximum optics of ±2.2 µm. It is designed with precision motors to provide high quality performance along with a repeatability and dynamic response for the most demanding alignment tasks. MICROTEC MA200 features a top-of-the-line 5-axis positioning equipment and uses a combination of stepper motors, direct-drive motors, and linear encoders to automatically move the masks in X, Y, Z, and Theta directions to ensure precise alignment. It also features a vacuum chuck for secure mask loading and ESD protection to ensure that your masks remain in perfect working condition. KARL SUSS MA-200 provides high-speed alignment with optimized imaging to achieve the highest accuracy and throughput possible. The alignment system also features high speed auto-focus capability with an improved image quality, and a powerful alignment software. This mask aligner is also integrated with an advanced vision processor to ensure fast and accurate measurements. It includes a precision calibration unit to ensure that the optical path is precisely aligned to provide the highest levels of accuracy and repeatability. In addition, KARL SUSS / MICROTEC MA-200 also features a different feature set such as a customizable user interface, an auto-information subsystem, a thermal compensation machine, and a precise PSD calibration. MICROTEC MA-200 is set up for air-bearing alignment, and is equipped with a convenient safety locking feature as well as status monitoring for user convenience. It also includes a detector array for quick multiple mask scanning and is designed with an advanced cooling tool for reliable operation. KARL SUSS MA 200 is designed with the latest in optical alignment technologies and is an ideal choice for a variety of photolithographic applications. With its high-precision alignment features and powerful performance, MA 200 is the perfect tool for accurate and reliable alignment of photolithography masks.
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