Used KARL SUSS / MICROTEC MA 200 #9298780 for sale

KARL SUSS / MICROTEC MA 200 Mask Aligner is a state of the art tool utilized in the photolithography process for the production of integrated circuits. MICROTEC MA200 offers superior accuracy and repeatability compared to other all-in-one mask aligners, making it ideal for production applications where device yield and accuracy are critical. KARL SUSS MA-200 utilizes an "XY table for substrate handling." This allows the device to precisely position the substrate in the X-Y plane during the lithographic process. Additionally, MA-200 has an "Auto-Z" feature which uses a head to automatically detect the thickness of the substrate and adjust alignment accordingly. This minimizes human-entered errors and ensures the lithographic process will perform accurately. Additionally, MA 200 mask aligner has an integrated vacuum chamber, which holds the substrate securely in place during the lithographic cycle. This prevents movement of the substrate due to external forces, and ensures the accuracy and repeatability of the process. MICROTEC MA-200 also has a feature that allows the user to automate alignment and step and repeat cycles, allowing for faster processing times. The system is mainly controlled through an external PC running Windows-based software. This makes KARL SUSS / MICROTEC MA200 easy to use, as all of the settings and adjustments can be manipulated via the PC. This PC also stores all process details on its hard disk, allowing for efficient repeatability and traceability of all photomask data, including device parameters, substrate, and exposure recipes. Finally, MA200 mask aligner utilizes an enclosed UV light-source, allowing it to perform both hard and soft UV lithography. This makes it a versatile tool for both prototype development and production volume runs. Overall, KARL SUSS MA 200 is a reliable and accurate mask aligner that is suitable for a variety of integrations into existing production lines. It has excellent repeatability, a comprehensive user management system, and is capable of both hard and soft UV lithography functions.