Used KARL SUSS / MICROTEC MA 200 #9302584 for sale

KARL SUSS / MICROTEC MA 200
ID: 9302584
Mask aligner, parts system.
KARL SUSS / MICROTEC MA 200 Mask Aligner is an advanced mask aligner that offers industry-leading precision and accuracy in the alignment, exposure and development of photomasks. This mask aligner is designed for precision mask alignment and processing in the microelectronics industry. Using advanced ultraviolet (UV) lithography technology, MICROTEC MA200 is capable of aligning and exposing up to four photomasks in a single wafer. The high alignment accuracy of the equipment ensures that each mask is accurately placed, oriented, and exposed in a precise manner. In addition, the mask can be accurately aligned and exposed throughout the imaging process, eliminating errors and providing reliable and repeatable results. KARL SUSS MA-200 features a top-level alignment accuracy of 6.5 microns with a minimum line width of 2.0 microns. This level of accuracy is achieved through the use of a unique optical-contact technique, which provides a maximum resolution and accuracy in the mask alignment. Additionally, KARL SUSS / MICROTEC MA200 features a programmable logic controller (PLC) technology for enhanced speed and accuracy in the alignment and development process. MA200 is a web-enabled system that provides real-time data on production data and unit status. This allows for remote monitoring and control, providing users with greater visibility and control of the processing parameters. MICROTEC MA 200 also features several safety enhancements, such as an on-screen emergency stop key, a light curtain safety machine, and a fire suppression tool. The light curtain asset helps minimize the risk of explosions and the fire suppression model keeps the equipment clean in case of a fire. Overall, KARL SUSS / MICROTEC MA-200 Mask Aligner is a highly accurate and efficient mask aligner. Featuring top-level alignment accuracy, web-enabled control, and a versatile feature set, KARL SUSS MA200 is an ideal choice for industrial mask alignment and development.
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