Used KARL SUSS / MICROTEC MA 200 #9356073 for sale

KARL SUSS / MICROTEC MA 200 is a precision mask aligner designed to handle a wide range of photolithography applications. It is capable of producing high-quality images with precise alignment. MICROTEC MA200 is an excellent choice for volume production, prototyping, and research in the areas of semiconductor device fabrication, advanced optoelectronics, and MEMS. KARL SUSS MA-200 uses a substrate chuck equipment to secure a substrate and its desired mask onto the exposure stage. The 180mm x 120mm accuracy stage allows for exacting and repeatable registration between the two. This allows for the precise alignment of fine geometries down to 0.005 um, with an accuracy of 0.5 um. The maximum effortless exposure area of 6.0 inches (152.4mm) expands the usable field throughout the gantry. KARL SUSS / MICROTEC MA200 uses a highly reliable solid-state Xenon lamp to deliver a uniform field of light over the substrate. The lamp is also equipped with a filter wheel to create multi-wavelength exposure options. Additionally, the unit comes with a built-in shutter control, allowing for a full range of exposure energies. Furthermore, an independent scattering shutter gives the user the option to shape the desired energy level in the exposure. For temperature control, KARL SUSS MA200 comes standard with a Peltier cooling system to ensure a consistent temperature throughout the process. This allows for reliable repeatability in a wide range of materials. Additionally, the unit comes equipped with a gas filter/purifier unit to clean incoming gas and minimize contamination. Safety is a priority with MA 200, as the machine automatically engages the safety features when the tool is in operation. Eye protection is essential when running MICROTEC MA 200, as the unit generates hazardous UV radiation when in use. For further peace of mind, the asset also comes with a dedicated safety interlock to ensure personnel safety at all times. MICROTEC MA-200 is an exceptionally capable machine, providing precise alignment and reproducibility for all kinds of photolithography applications. Perfect for research, development, and manufacturing, MA200 stands out as a reliable and efficient choice for projects needing accurate photolithography.