Used KARL SUSS / MICROTEC MA 200 #9381588 for sale

ID: 9381588
Wafer Size: 6"-8"
Vintage: 1992
Mask aligner, 6"-8" 1992 vintage.
KARL SUSS / MICROTEC MA 200 is a high-precision mask aligner used for creating patterns and photolithography in optoelectronic, IC, MEMs, and thin-film device production. It features a high-resolution stepper stage to allow for accurate alignment of devices with contact holes, isolation elements, vias, and even large circuits. The optical equipment of MICROTEC MA200 uses an illuminated 4-micron reticle and a quick-stepping Galvo scanner to achieve a precise resolution of 1 µm. The light source is a halogen lamp for quick exposure times and an even illumination field across the entire substrate. The collected light is routed through a monochromator which reduces ambient light and ensures a uniform frequency across the surface of the sample. KARL SUSS MA-200 has a robust housing constructed of stainless steel and a room temperature range of 15°C to 25°C, plus a humidity range of 10% to 80%. It is also equipped with automatic wafer handling, a motorized door that helps to access substrates, and a vacuum-sealed chamber. The aligner also includes an autofocus system capable of adjusting the sites' heights while applying pressure to maintain contact between the substrate and reticle. This makes it easier to achieve higher levels of accuracy, especially when it comes to aligning small etched features. KARL SUSS MA 200's template-assisted masking features enable faster switching between different substrates or patterns with no additional tools. It also features an integrated spectroscopic reflectometry unit to monitor the darkness and contrast of device features, aiding in production cycle tuning. A built-in communication machine allows for programming with standard interfaces such as Ethernet and RS-232. MA200 is a highly precise mask aligner that is perfect for IC, optoelectronic, thin-film device, and MEMs production. Its high-performance optics and autofocus tool ensure perfect alignment between substrate and reticle. It also includes template-assisted masking, integrated spectroscopic reflectometry, and communication capabilities. All of these features make MICROTEC MA 200 an ideal option for high-precision device production.
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